AIXTRON participates in research project for increasing energy efficiency in the deposition of SiC layers

AIXTRON participates in research project for increasing energy efficiency in the deposition of SiC layers

Herzogenrath, July 3^rd, 2025 – AIXTRON SE (FSE: AIXA) Fraunhofer IISB in Erlangen and bimanu Cloud Solutions GmbH in Neuss will jointly improve energy efficiency in the production of semiconductor layers based on silicon carbide (SiC). To this end, the partners are cooperating in the project “Increasing Energy Efficiency in SiC Epitaxy,” which is funded by the German Federal Ministry of Education and Research (BMBF) and led by AIXTRON.

The aim of the €28.4 million project is to increase resource efficiency (water and energy consumption, waste volume) in the production of layer structures made from SiC compound semiconductors. AI-based methods are being researched and developed for both material- and energy-efficient manufacturing processes and products. The potential here is huge: the aim is to halve the electrical energy required per unit area in the manufacture of SiC semiconductors.

“Semiconductors based on SiC offer significantly better energy efficiency than conventional silicon, for example in electromobility or renewable energies. However, the production of semiconductors is fundamentally energy-intensive. We therefore see a particularly significant opportunity here to make the production of these forward-looking technologies even more efficient and thus promote their widespread use and the green transformation,” says Prof. Dr. Michael Heuken, VP Advanced Technologies, explaining the significance of the project. 

Based on the project work, production processes are to be improved and recommendations for action researched. This is precisely where bimanu's expertise will come into play. The software provider specializes in data integration and analysis in the areas of business intelligence, marketing analytics, Industry 4.0, and energy management.  

Fraunhofer IISB is contributing its unique expertise in SiC, both in research and development in this material class and in the further development of processes. Fraunhofer IISB operates the only continuous 150 mm SiC development line in Germany, which is number one in Europe and among the top five in the world. 

AIXTRON's focus within the project will be on researching tooltechnology and thus advancing tool development. To this end, several test systems will be set up and operated. The simulation models will be verified on these tools, while the data and models will be developed and tested in cooparation with bimanu. 

Contact

Christian Ludwig

Vice President Investor Relations & Corporate Communications

fon +49 (2407) 9030-444

e-mail c.ludwig@aixtron.com

About AIXTRON:

AIXTRON SE is a leading provider of deposition equipment to the semiconductor industry. The Company was founded in 1983 and is headquartered in Herzogenrath (near Aachen), Germany, with subsidiaries and sales offices in Asia, United States, and in Europe. AIXTRON´s technology solutions are used by a diverse range of customers worldwide to build advanced components for electronic and optoelectronic applications based on compound or organic semiconductor materials. Such components are used in a broad range of innovative applications, technologies and industries. These include Laser and LED applications, display technologies, data transmission, SiC and GaN power management and conversion, communication, signaling and lighting as well as a range of other leading-edge applications.

Our registered trademarks: AIXACT®, AIXTRON®, Atomic Level SolutionS®, Close Coupled Showerhead®, CRIUS®, Gas Foil Rotation®, OVPD®, Planetary Reactor®, PVPD®, TriJet®

For further information on AIXTRON (FSE: AIXA, ISIN DE000A0WMPJ6) please visit our website at: www.aixtron.com.

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